Photoluminescence in silicon/silicon oxide films produced by the Pulsed Electron Beam Ablation technique

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dc.contributor.authorAraya, M.
dc.contributor.authorDíaz, Donovan
dc.date.accessioned2016-05-10T18:11:19Z
dc.date.available2016-05-10T18:11:19Z
dc.date.issued2012
dc.fechaingreso.objetodigital2024-11-07
dc.identifier.issn0022-3093
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/13229
dc.identifier.urihttps://doi.org/10.1016/j.jnoncrysol.2011.12.072
dc.language.isoen
dc.nota.accesoContenido parcial
dc.relation.isformatofJournal of Non-Crystalline Solids Vol. 358 (5), p. 880-884.
dc.revistaJournal of Non-Crystalline Solidses_ES
dc.rightsacceso restringido
dc.subject.ddc620
dc.subject.deweyIngenieríaes_ES
dc.subject.otherFotoluminiscenciaes_ES
dc.subject.otherEspectroscopía de Ramanes_ES
dc.subject.otherElectroneses_ES
dc.titlePhotoluminescence in silicon/silicon oxide films produced by the Pulsed Electron Beam Ablation techniquees_ES
dc.typeartículo
dc.volumenVol. 358
sipa.codpersvinculados1008066
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