Dual radio frequency plasma source: Understanding via electrical asymmetry effect

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dc.contributor.authorBora, Bijit
dc.contributor.authorBhuyan, Heman
dc.contributor.authorFavre Domínguez, Mario
dc.contributor.authorWyndham, Edmund
dc.contributor.authorBora, Bijit
dc.contributor.authorBhuyan, Heman
dc.contributor.authorFavre Domínguez, Mario
dc.contributor.authorWyndham, Edmund
dc.date.accessioned2016-05-10T18:10:49Z
dc.date.available2016-05-10T18:10:49Z
dc.date.issued2013
dc.identifier.issn0021-8979
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/12971
dc.language.isoen
dc.nota.accesoContenido parcial
dc.relation.isformatofJournal of Applied Physics No. 15 (113), Art. 153301.
dc.revistaJournal of Applied Physicses_ES
dc.rightsacceso restringido
dc.subject.ddc510
dc.subject.deweyMatemática física y químicaes_ES
dc.subject.otherPlasma (Gases ionizados)es_ES
dc.subject.otherFísicaes_ES
dc.titleDual radio frequency plasma source: Understanding via electrical asymmetry effectes_ES
dc.typeartículo
sipa.codpersvinculados1011568
sipa.codpersvinculados1003913
sipa.codpersvinculados99732
sipa.codpersvinculados100407
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