Studies on scalability and scaling laws for the plasma focus: Similarities and differences in devices from 1MJ to 0.1 J

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dc.contributor.authorSoto, Leopoldo
dc.contributor.authorPavez, C.
dc.contributor.authorTarifeño, A.
dc.contributor.authorMoreno, J.
dc.contributor.authorVeloso Espinosa, Felipe Eduardo
dc.date.accessioned2021-04-09T21:14:14Z
dc.date.available2021-04-09T21:14:14Z
dc.date.issued2010
dc.fuente.origenBibliotecas UC
dc.identifier.doi10.1088/0963-0252/19/5/055017
dc.identifier.issn1361-6595
dc.identifier.scopusid2-s2.0-78149339679
dc.identifier.urihttps://doi.org/10.1088/0963-0252/19/5/055017
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/57573
dc.identifier.wosidWOS:000282096600017
dc.issue.numeroNo. 5
dc.language.isoen
dc.revistaPlasma Sources Science And Technologyes_ES
dc.rightsacceso restringido
dc.titleStudies on scalability and scaling laws for the plasma focus: Similarities and differences in devices from 1MJ to 0.1 Jes_ES
dc.typeartículo
dc.volumenVol. 19
sipa.codpersvinculados14943
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